Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
CHEMICAL REACTION APPARATUS, REACTION CONTROLLING THEREFOR DISCARDING METHOD CHEMICAL AND SUPPLYING METHOD FOR CHEMICAL
Document Type and Number:
Japanese Patent JP3151957
Kind Code:
B2
Abstract:

PURPOSE: To provide a reaction apparatus in which interruption of production does not occur even at the time of discarding and replacing chemicals while preventing a decrease in an etching accuracy.
CONSTITUTION: Chemicals circulation tanks 10-1, 10-2 are connected to two reaction chambers 1-1, 1-2 for etching through three-way valves 33-1, 33-2, and connecting states of the tanks 10-1, 10-2 to the chambers 1-1, 1-2 can be suitably switched by the valves 33-1, 33-2. Two sets of the tanks 10-1, 10-2 and the chambers 1-1, 1-2 are prepared, and the connecting states of the tanks 10-1, 10-2 and the chambers 1-1, 1-2 can be switched, thereby reducing a decreasing width of reaction velocity in reaction liquid replacing life period. In the case of, for example, etching reaction, an etching accuracy can be largely improved.


Inventors:
Kiyohiro Kawasaki
Application Number:
JP26850092A
Publication Date:
April 03, 2001
Filing Date:
October 07, 1992
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Matsushita Electric Industrial Co., Ltd
International Classes:
C23F1/08; B08B3/08; H01L21/027; H01L21/205; H01L21/30; H01L21/304; H01L21/306; H01L21/31; (IPC1-7): H01L21/304; B08B3/08; H01L21/306
Domestic Patent References:
JP4290432A
JP4256318A
JP4126578A
JP326308A
JP2310989A
JP297024A
JP63289819A
JP62258735A
Attorney, Agent or Firm:
Fumio Iwahashi (2 others)