Title:
SHOWER HEAD AND SUBSTRATE TREATMENT DEVICE
Document Type and Number:
Japanese Patent JP2022189180
Kind Code:
A
Abstract:
To provide a shower head and a substrate treatment device for improving in-plane distribution of film thickness.SOLUTION: A shower head comprises: a shower plate; a base member provided with a gas passage and fixing the shower plate; and plural gas supply members arranged in a gas diffusion space formed between the shower plate and the base member, and connected to the gas passage. The gas supply member has plural emission ports for emitting gas in a radial direction, and the gas emitted from the emission ports of the gas supply members form a swirl flow.SELECTED DRAWING: Figure 3
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Inventors:
KAWAGUCHI TAKUYA
HOTTA JUNJI
NARUSHIMA KENSAKU
YAMASAKI HIDEAKI
KAKEGAWA TAKASHI
TAKAGI TOSHIO
YAMAUCHI TAKAYA
HOTTA JUNJI
NARUSHIMA KENSAKU
YAMASAKI HIDEAKI
KAKEGAWA TAKASHI
TAKAGI TOSHIO
YAMAUCHI TAKAYA
Application Number:
JP2021097606A
Publication Date:
December 22, 2022
Filing Date:
June 10, 2021
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
C23C16/455; H01L21/31
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Tadahiko Ito