Title:
シリコンの製造装置及び方法
Document Type and Number:
Japanese Patent JP5448833
Kind Code:
B2
Abstract:
In a device and a method for the processing of non-ferrous metals for simple and economic reduction of the concentration of impurity elements and/or impurity compounds contained in the non-ferrous metal, it is provided to gas the non-ferrous metal in a processing column with at least one gas at a low pressure, causing the impurity elements and/or impurity compounds to evaporate.
Inventors:
Wambach Karlsten
Knopf Claudia
Rafer Ingo
Knopf Claudia
Rafer Ingo
Application Number:
JP2009538599A
Publication Date:
March 19, 2014
Filing Date:
October 13, 2007
Export Citation:
Assignee:
Sanicon AG
International Classes:
C01B33/02
Domestic Patent References:
| JP2001294949A |
Foreign References:
| EP0530567A1 | ||||
| WO1999033749A1 |
Attorney, Agent or Firm:
Fujita Akira
Hideki Imai
Hideki Imai