Title:
Silicon system particle distribution coating liquid and a manufacturing method for the same
Document Type and Number:
Japanese Patent JP6139117
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a silicon-based particle-dispersed coating liquid which has high dispersion homogeneity and good storage stability, and provides a coating film having good surface smoothness and uniformity.SOLUTION: The silicon-based particle-dispersed coating liquid includes: an imide-based polymer in an amount of 0.5-15 mass%; and silicon-based particles having an average particle diameter less than 1 μm and a maximum particle diameter less than 2 μm. A method for producing the coating liquid comprises pulverizing silicon-based particles having an average particle diameter of 1 μm or more in an amide-based solvent by a bead mill using a media having a particle diameter of 2 mm or less to obtain a silicon-based particle dispersion having an average particle diameter less than 1 μm, and then adding an imide-based polymer to the resulting dispersion, without isolating the silicon-based particles from the dispersion, and mixing them.
Inventors:
Hisashi Eguchi
Masahiro Hosoda
Yoshiaki Echigo
Masahiro Hosoda
Yoshiaki Echigo
Application Number:
JP2012267308A
Publication Date:
May 31, 2017
Filing Date:
December 06, 2012
Export Citation:
Assignee:
UNITIKA LTD.
International Classes:
C09D179/08; C09D7/12
Domestic Patent References:
| JP2011086480A | ||||
| JP2008016446A | ||||
| JP2004311428A | ||||
| JP2007149604A | ||||
| JP2008146868A | ||||
| JP2004185810A | ||||
| JP2009538513A | ||||
| JP2012204181A | ||||
| JP2008041307A | ||||
| JP62062868A |
Foreign References:
| WO2007114168A1 | ||||
| WO2010150513A1 |