Title:
SLURRY SUPPLY DEVICE, SLURRY SUPPLY METHOD AND SLURRY GENERATION METHOD
Document Type and Number:
Japanese Patent JP2022011439
Kind Code:
A
Abstract:
To provide a slurry supply device which can maintain concentration of a slurry and/or can make the concentration of the slurry uniform.SOLUTION: A slurry supply device 1 has a tank 11. The tank 11 has a space around a rotation axis RA crossing a vertical direction. The supply device 1 has an inflow part for making the slurry 101 inflow to the space, an outflow part for making the slurry 101 outflow from the space, and a support part 13 for rotatably supporting the tank 11 around the rotation axis RA.SELECTED DRAWING: Figure 1
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Inventors:
FUKUDA MASAHIKO
TANAKA KATSUTOSHI
TANAKA KATSUTOSHI
Application Number:
JP2020112581A
Publication Date:
January 17, 2022
Filing Date:
June 30, 2020
Export Citation:
Assignee:
SHIBAURA MACHINE CO LTD
International Classes:
B24B57/00; B01J4/00
Domestic Patent References:
| JP2007184337A | 2007-07-19 | |||
| JP5443243B2 | 2014-03-19 |
Attorney, Agent or Firm:
Yasuhiro Iijima