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Title:
SOLVENT MIXTURE FOR REMOVAL OF HIGH PURITY PRECURSOR
Document Type and Number:
Japanese Patent JP2002219432
Kind Code:
A
Abstract:

To provide a cleaning method to remove the residual chemicals safely and effectively at a manifold to deliver high purity chemicals by using a solvent.

This is a method to clean a manifold which delivers high purity raw material chemicals from a high purity raw material chemicals container to the place where they are used after the delivery of the high purity raw material chemicals is suspended. This cleaning method includes processes to exhaust the manifold by connecting to a vacuum source, to finish the exhaust, to introduce at least one solvent for high purity raw material chemicals from at least one source of at least one solvent to the manifold, to dissolve residual high purity raw material chemicals in the manifold into at least one solvent, to discharge the obtained mixture of residual high purity raw material chemicals and the solvent from the manifold, and to purge the manifold by connecting to an inert gas source.


Inventors:
ZORICH ROBERT SAM
LEI XINJIAN
SILVA DAVID JAMES
TRENT CYNTHIA LEE
Application Number:
JP2001300498A
Publication Date:
August 06, 2002
Filing Date:
September 28, 2001
Export Citation:
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Assignee:
AIR PROD & CHEM
International Classes:
B08B9/027; B08B3/08; B08B9/00; B08B9/02; C11D7/50; C11D11/00; H01L21/205; H01L21/306; C11D7/24; (IPC1-7): B08B9/027; B08B3/08; H01L21/306
Attorney, Agent or Firm:
Takashi Ishida (4 others)



 
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