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Title:
SPACER FOR DISCHARGE PLASMA SINTERING, DISCHARGE PLASMA SINTERING DEVICE, AND DISCHARGE PLASMA SINTERING METHOD
Document Type and Number:
Japanese Patent JP2018008833
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a silicon carbide spacer capable of stably conducting discharge plasma sintering by suppressing generation of breakage by the discharge plasma sintering.SOLUTION: The spacer for discharge plasma sintering is a silicon carbide spacer 12 containing silicon carbide and having a circular truncated cone shape. The silicon carbide spacer 12 is arranged between a punch 112 of a molding tool for discharge plasma sintering 11 having a cylinder 111 and the punch 112, and a compression ram 14 for applying pressure to the punch 112 in a discharge plasma sintering device 1 and is used with having a small flat surface 21 with a circular truncated cone shape arranged in a punch 112 side. Diameter of the small flat surface 21 (d) is constituted to satisfy a relationship of 1≤d/a<1.5 by a ratio with diameter of the punch 112 (a).SELECTED DRAWING: Figure 2

Inventors:
KAKEGAWA KAZUYUKI
NAKAMURA NOBUO
Application Number:
JP2016136794A
Publication Date:
January 18, 2018
Filing Date:
July 11, 2016
Export Citation:
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Assignee:
SUMITOMO METAL MINING CO
KAKEGAWA KAZUYUKI
International Classes:
C04B35/645; B22F3/105; B22F3/14; B28B3/00; C04B35/569
Attorney, Agent or Firm:
Masayuki Masabayashi
Hayashi Ichiyoshi