PURPOSE: To exhibit stable attractive force in a wide temperature range, and cause no damage to an object to be retained, by constituting a plurality of attraction parts different in resistivity.

CONSTITUTION: When a wafer is loaded, a load chamber and a carrier chamber 36 connect only a voltage applying switch 10a of a chuck 3 for normal temperature with 10b, and a wafer 1 is attracted and retained, which is carried to a process chamber 3!. When the retaining is released, the switch 10a is turned to the 10c side. When the processing in the process chamber 31 is low temperature etching, only a voltage applying switch 12a of a chuck 5 for lower temperature is connected with 12b, and the wafer 1 is attracted and retained, which is carried to the next process chamber 32. Chucks 3, 4, 5, which are dielectric constituting an electrostatic attraction equipment, are composed of materials different in resistivity. Thereby a specimen retainer can be obtained which has stable attractive force in a wide range from a low temperature to a high temperature, without causing the breakdown of a semiconductor element due to an excessive current.