Title:
エキシマ光源におけるスペックルの低減
Document Type and Number:
Japanese Patent JP7430748
Kind Code:
B2
Abstract:
A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
Inventors:
Duffy, Thomas Patrick
Frank, Everts
King, Brian Edward
Thorns, Joshua John
Optroot, Wilhelms, Patrick, Elizabeth, Maria
Godfried, Hermann, Philip
Frank, Everts
King, Brian Edward
Thorns, Joshua John
Optroot, Wilhelms, Patrick, Elizabeth, Maria
Godfried, Hermann, Philip
Application Number:
JP2022110325A
Publication Date:
February 13, 2024
Filing Date:
July 08, 2022
Export Citation:
Assignee:
Cymer Limited Liability Company
ASM L Netherlands B.V.
ASM L Netherlands B.V.
International Classes:
G03F7/20; H01S3/00; H01S3/10
Domestic Patent References:
| JP6874137B2 | ||||
| JP7104828B2 | ||||
| JP9162104A | ||||
| JP2008277617A | ||||
| JP10012542A |
Foreign References:
| WO2000070660A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
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