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Title:
SPUTTERING APPARATUS
Document Type and Number:
Japanese Patent JPS52145380
Kind Code:
A
Abstract:

PURPOSE: To produce excellent uniform membrane on a base plate holder compared with the membrane obtained on a conventional holder by use of a curved, not parallel, holder which is placed opposite to the target.


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JP2689524[Title of Invention] Vacuum Physical Deposition Method
Inventors:
SHIMOMOTO TAIJI
IMAMURA YOSHINORI
Application Number:
JP6230876A
Publication Date:
December 03, 1977
Filing Date:
May 31, 1976
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
C23C14/50; C23C14/34; H01J37/34; (IPC1-7): C23C15/00



 
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