スパッタリングターゲット、積層膜の製造方法、積層膜および、磁気記録媒体

Title:

スパッタリングターゲット、積層膜の製造方法、積層膜および、磁気記録媒体

Document Type and Number:

Japanese Patent JP7153634

Kind Code:

B2

Abstract:

A sputtering target according to the present invention contains Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, and wherein the sputtering target contains Nb2O5 as a metal oxide component.

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Inventors:

Shimizu Masayoshi
Yasuyuki Iwabuchi
Aimi Masuda

Application Number:

JP2019512701A

Publication Date:

October 14, 2022

Filing Date:

August 16, 2018

Export Citation:

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Assignee:

JX Nippon Mining & Metals Co., Ltd.

International Classes:

C23C14/34; G11B5/64; G11B5/851; H01F10/16; H01F41/18

Domestic Patent References:

JP2009252310A
JP2014074219A
JP2010176727A
JP2012102399A
JP2001026860A
JP2006299401A

Foreign References:

WO2011016365A1

Attorney, Agent or Firm:

Axis International Patent Business Corporation

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