Title:
SPUTTERING TARGET MADE OF SINTERED AL ALLOY
Document Type and Number:
Japanese Patent JPH09241835
Kind Code:
A
Abstract:
To provide a sputtering target made of a sintered Al alloy for forming reflecting coating or the wiring of liq. crystal TFT used for optical media such as optical disks executing the recording and erasing of information using an optical beam.
The surface of this sputtering target made of a sintered Al alloy has a compsn. contg. one or ≥ two kinds among Ta, Zr, Ti, Hf, Nb, Cr, W and Mo (hereinafter referred to as M) by 0.5 to 30 atomic %, and the balance Al with inevitable impurities, and also, the content of M is reduced by the concn. gradient of 0.005 to 0.5 atomic %/mm in the thickness direction from the surface 2 of the sputtering target 1 to the back side 3.
Inventors:
FUKUI SOICHI
Application Number:
JP4599796A
Publication Date:
September 16, 1997
Filing Date:
March 04, 1996
Export Citation:
Assignee:
MITSUBISHI MATERIALS CORP
International Classes:
C22C1/04; C22C21/00; C23C14/14; C23C14/34; H01L29/786; (IPC1-7): C23C14/34; C22C21/00; C23C14/14; H01L29/786
Attorney, Agent or Firm:
Kazuo Tomita (1 person outside)