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Title:
磁気記録媒体用スパッタリングターゲット
Document Type and Number:
Japanese Patent JP6958819
Kind Code:
B2
Abstract:
A sputtering target for magnetic recording media capable of producing a magnetic thin film in which the magnetic crystal grains are micronized and the distance between the centers of the grains is reduced while good magnetic properties are maintained. The target including metallic Pt and an oxide, with the balance being metallic Co and inevitable impurities, wherein the Co is contained in a range of 70 at % to 90 at % and the Pt is contained in a range of 10 at % to 30 at % relative to a total of metallic components in the sputtering target for magnetic recording media, the oxide is contained in a range of 26 vol % to 40 vol % relative to a total volume of the sputtering target for magnetic recording media, and the oxide is composed of B2O3 and one or more high-melting-point oxides having a melting point of 1470° C. or higher and 2800° C. or lower.

Inventors:
Tam Kim Kong
Ryosuke Kushibiki
Toshiya Yamamoto
Shin Saito
Shintaro Hinata
Application Number:
JP2018548601A
Publication Date:
November 02, 2021
Filing Date:
October 11, 2017
Export Citation:
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Assignee:
Tanaka Kikinzoku Kogyo Co., Ltd.
Tohoku University
International Classes:
G11B5/851; C22C1/10; C22C19/07; C22C32/00; C23C14/34; G11B5/64
Domestic Patent References:
JP2015032336A
JP2007004957A
Foreign References:
WO2016133047A1
Attorney, Agent or Firm:
Patent business corporation mts international patent office
Keisuke Matsuyama
Satoshi Takaya
Takashi Fujita