Title:
薄膜形成用スパッタリングターゲット材、それを用いて形成されて成る薄膜及び光学記録媒体
Document Type and Number:
Japanese Patent JP4638015
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an alloy material which maintains high reflectance, has enhanced weather resistance, is easily produced as the alloy and has stability and simplicity in a sputtering stage when used as a sputtering target and to provide a thin film and an optical recording medium. SOLUTION: An alloy obtained by incorporating Ag with, by weight, 0.1 to 5.0% Au and containing at least one or more kinds of elements selected from the groups consisting of Cu, Al, Ti, Pd, Ni, V, Ta, W, Mo, Cr, Ru and Mg by 0.1 to 5.0% is used as a sputtering target material for thin film deposition, thereby a thin film composing an optical recording medium 10, i.e., a reflection film 16 is deposited, so that the optical recording medium 10 using the reflection film as a composing element is produced.
Inventors:
Takashi Ueno
Nobuhiro Oda
Nobuhiro Oda
Application Number:
JP2000333559A
Publication Date:
February 23, 2011
Filing Date:
October 31, 2000
Export Citation:
Assignee:
Furuya Metal Co., Ltd.
International Classes:
C22C5/06; C23C14/34; G11B7/258; G11B7/2585; G11B7/259; G11B7/2595; G11B7/26
Domestic Patent References:
| JP11025515A | ||||
| JP9324264A | ||||
| JP2002015464A | ||||
| JP2001004993A |
Foreign References:
| WO1999067084A1 |
Attorney, Agent or Firm:
Mutsumi Yanase
Atsushi Watanabe
Atsushi Watanabe