To provide stage equipment where the disturbances of a magnetic field is little, equipment is simple and controllability can be improved.

The stage equipment 1 is provided with a wafer table 32 for mounting a wafer, arms 41 for stretching in the symmetrical directions setting the wafer table 32 as a center, and movable stages 71a, 71b, etc. Planar motor needles 45 are installed on both ends of the arms 41, and can move in two directions (X direction, Y direction) of a guide plane and around a shaft (θdirection), perpendicular to the guide plane. Guide 73a, 73b are engaged with the movable stages 71a, 71b via gas bearings. Guides 77, 78, 79 are engaged with sliders 75, 76 connected with the guides 73a, 73b via gas bearings. Vertical and horizontal sliding surfaces of the slider 75 are guided by gas bearings, and only the vertical surface of the slider 76 is guided.