Title:
フォトレジスト除去用ストリッパー組成物およびそれを用いたフォトレジストの剥離方法
Document Type and Number:
Japanese Patent JP7306553
Kind Code:
B2
Abstract:
To provide a stripper composition for photoresist removal which has excellent peeling force against a photoresist, suppresses corrosion on a lower metal film in a peeling step, and has improved photoresist solubility.SOLUTION: A stripper composition for photoresist removal contains a primary or secondary linear amine compound, a cyclic amine compound, an amide compound which has a boiling point of 180°C or higher and one to two 1-5C straight-chain or branched-chain alkyl groups substituted with nitrogen, a protonic solvent, and a corrosion inhibitor, wherein 60-90 wt.% of the amide compound has the boiling point of 180°C or higher and the one to two 1-5C straight-chain or branched-chain alkyl groups substituted with nitrogen is contained with respect to the total weight of the stripper composition, and a weight ratio of the primary or secondary linear amine compound and the cyclic amine compound is 100:1 to 1:1 in a weight ratio.SELECTED DRAWING: Figure 1
Inventors:
Sung, Seon Min
Park, Tae Moon
Song, Hyun Woo
Choi, Youngsung
Park, Tae Moon
Song, Hyun Woo
Choi, Youngsung
Application Number:
JP2022153867A
Publication Date:
July 11, 2023
Filing Date:
September 27, 2022
Export Citation:
Assignee:
LG HAUSYS,LTD.
International Classes:
G03F7/42; H01L21/027; H01L21/304
Domestic Patent References:
| JP2017527838A | ||||
| JP2016513273A | ||||
| JP2012118368A | ||||
| JP20083594A | ||||
| JP200679093A |
Foreign References:
| US5648324 |
Attorney, Agent or Firm:
Patent Attorney Corporation RYUKA International Patent Office
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