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Title:
STRIPPING OF PHOTOSETTING PHOTORESIST LAYER
Document Type and Number:
Japanese Patent JPS6250832
Kind Code:
A
Abstract:
Light-hardened photoresist layers are stripped by treating the layer with an aqueous solution of an organic quaternary ammonium base and, optionally a strong inorganic base. The resulting layer residues are dispersed as relatively small flakes which do not become lodged between conducting paths.

Inventors:
HARUTOMUUTO SHIYUTETSUPAN
URURIHI GAISURAA
Application Number:
JP19744186A
Publication Date:
March 05, 1987
Filing Date:
August 25, 1986
Export Citation:
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Assignee:
HOECHST AG
International Classes:
G03F7/42; G03D3/06; (IPC1-7): G03C11/00; G03F7/00
Domestic Patent References:
JPS60147736A1985-08-03
JPS5990850A1984-05-25
JPS6012546A1985-01-22
JPS5635424A1981-04-08
JPS4984437A1974-08-14
Attorney, Agent or Firm:
Toshio Yano



 
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