Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
STRUCTURE FOR HERMETICALLY SEALING PROCESSING PART OF PHOTOSENSITIVE MATERIAL PROCESSOR
Document Type and Number:
Japanese Patent JPH11282142
Kind Code:
A
Abstract:

To interrupt the flow of air in a processing part, to reduce the deterioration of processing solution due to carbon dioxide and to decrease the replenishing amount of the processing solution.

A box-type shielding cover 76 is disposed on the liquid level of developer reservoired in a developing tank 14, and the bottom wall 76A of the cover 76 keeps the contact of the processing solution with air as small as possible so as to restrain the deterioration of the processing solution by the carbon dioxide and the evaporation of moisture. The cover 78 covering the upper part of a PS plate processor is brought into contact with the upper part of the peripheral wall 76B of the cover 76 and interrupts the flow of air (flow of air leading to an exhaust port from an insertion port 22) above the developer. Thus, the sealing degree of a developing part 18 is made high, the deterioration of the developer by the carbon dioxide is reduced and the replenishing amount of the developer is decreased.


Inventors:
ICHIKAWA KAZUO
MIYAMOTO SHINICHI
MIYAMOTO KENICHI
TAKIGAMI TOMOYUKI
TAKEO YUTAKA
YOSHIDA SUSUMU
KANZAKI TOSHIO
Application Number:
JP8326398A
Publication Date:
October 15, 1999
Filing Date:
March 30, 1998
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03D3/00; G03F7/30; (IPC1-7): G03D3/00; G03F7/30
Attorney, Agent or Firm:
Atsushi Nakajima (3 outside)