Title:
STRUCTURED DEPILATORY COMPOSITION
Document Type and Number:
Japanese Patent JP2009051818
Kind Code:
A
Abstract:
To provide a structured composition containing a depilatory active material by basing on consideration that "structured" compositions in personal care products are technically known, so it is preferable to use preferable fluidity and beautifying effect of a structured system together with a depilatory active material system, but it is difficult to form a stable structured depilatory composition caused by invasive nature of the depilatory active material, and develop a method for producing the composition.
The composition comprising the depilatory active material and a surfactant is provided. The composition has a yield stress of from about 1 pascal (Pa) to about 1,500 Pa. A method for using thereof is also provided.
Inventors:
GUNN EUEN T
TYERECH MICHAEL R
TYERECH MICHAEL R
Application Number:
JP2008168171A
Publication Date:
March 12, 2009
Filing Date:
June 27, 2008
Export Citation:
Assignee:
MCNEIL PPC INC
International Classes:
A61K8/46; A61K8/34; A61K8/36; A61K8/362; A61K8/42; A61K8/44; A61K8/55; A61Q9/04
Attorney, Agent or Firm:
Konobu Kato
Hiroshi Oshino
Chie Fujita
Hiroshi Oshino
Chie Fujita