Title:
SUBSTRATE CHUCK OF ALIGNER
Document Type and Number:
Japanese Patent JPH05234843
Kind Code:
A
Abstract:
PURPOSE: To form a high-accuracy and high-resolution resist pattern on a transparent substrate or a semitransparent substrate by restraining the reflection, of a beam of exposure light, which is caused on a face on the substrate holding side of a substrate chuck.
CONSTITUTION: In a substrate chuck 10, an antireflection film 12 whose thickness is 1/4 of an exposure wavelength is formed on the surface of a chuck main body 11. Alternatively, a light-absorbing film which absorbs a beam of exposure light is formed on the surface of a chuck main body 11; in addition, an antireflection film whose thickness is 1/4 of an exposure wavelength is formed on the surface of the light-absorbing film.
Inventors:
HIKICHI KUNIHIKO
OTSUKA YOICHI
OTSUKA YOICHI
Application Number:
JP7268892A
Publication Date:
September 10, 1993
Filing Date:
February 21, 1992
Export Citation:
Assignee:
SONY CORP
International Classes:
G03F7/20; H01L21/027; H01L21/30; H01L21/68; H01L21/683; (IPC1-7): H01L21/027; G03F7/20; H01L21/68
Attorney, Agent or Firm:
Funabashi Kuninori