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Title:
SUBSTRATE DRYING DEVICE
Document Type and Number:
Japanese Patent JP3710630
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To obtain a substrate drying device of a structure, wherein a holding of substrates at the time of a rotary drying treatment can be performed satisfactorily, over a long time.
SOLUTION: A boat 20 receives a plurality of substrates W adhered with a treating liquid at the outside of a rotor 10 to deliver the substrates W to lower substrate holding members 13, and then the boat 20 is moved to a position where the boat does not come into contact with the substrates W. The substrates W are held by upper substrate holding members 12 and the members 13, and a drying treatment of the substrates W is performed by the rotation of the rotor 10. At drying treatment, the falling down of the substrates W is controlled by substrate arrangement members 14 provided in the interior of the rotor 10. Since the boat 20 does not come into contact with the substrates W, a load from the substrates W acts on the boat 20 through the centrifugal force accompanied caused by the rotation of the substrates W, the board 20 is inflicted by deformations and damages, and the need for exchanging the substrates W is also eliminated. By transferring the function of regulating the fall down of the substrates to the members 14, the members 12 can be simplified. As a result, the holding of the substrates W at a rotary drying process can be performed satisfactorily over a long time, and the cost for drying the substrates W can be reduced.


Inventors:
Naoji Maekawa
Koji Hasegawa
Application Number:
JP27176698A
Publication Date:
October 26, 2005
Filing Date:
September 25, 1998
Export Citation:
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Assignee:
Dainippon Screen Mfg. Co., Ltd.
International Classes:
H01L21/677; F26B5/08; F26B11/04; H01L21/304; H01L21/68; (IPC1-7): H01L21/304; F26B5/08; F26B11/04; H01L21/68
Domestic Patent References:
JP7022377A
JP10223601A
JP63208223A
JP8017784A
Attorney, Agent or Firm:
Shigeaki Yoshida
Yoshitake Hidetoshi
Takahiro Arita