Title:
SUBSTRATE EQUIPPED WITH ORGANIC FUNCTIONAL LAYER AND METHOD FOR PRODUCING THE SAME
Document Type and Number:
Japanese Patent JP2015157370
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate equipped with an organic functional layer having a protective film excellent in stability under a high temperature and high humidity environment without causing loss due to reflection light, and to provide method for producing the same.SOLUTION: There is provided a substrate equipped with an organic functional layer which has a base material, an organic functional layer disposed on the base material and a protective film disposed on the organic functional layer. The protective film has a plurality of silicon oxynitride layers and the absolute value of the refractive index difference between the silicon oxynitride layers is 0.1 or less. In the protective film, the silicon oxynitride layer on a side far from the organic functional layer of the plurality of silicon oxynitride layers has a film thickness of 50 nm or more and the density is larger by 0.05 (g/cm) or more than the density of the silicon oxynitride layer formed on a position closest to the organic functional layer.
More Like This:
Inventors:
IMAI SHINJI
Application Number:
JP2014032156A
Publication Date:
September 03, 2015
Filing Date:
February 21, 2014
Export Citation:
Assignee:
FUJIFILM CORP
International Classes:
B32B9/00; C23C16/42; G02B1/11; H01L27/14; H01L27/146; H01L31/0216; H01L51/50; H05B33/04; H05B33/10; H05B33/12
Domestic Patent References:
| JP2007220646A | 2007-08-30 |
Attorney, Agent or Firm:
Nozomi Watanabe
Haruko Sanwa
Hideaki Ito
Fumio Mitsuhashi
Haruko Sanwa
Hideaki Ito
Fumio Mitsuhashi