Title:
SUBSTRATE HOLDER FOR FILM DEPOSITION BY SPUTTERING, AND FABRICATION OF PHOTOMASK BLANK USING THE SAME
Document Type and Number:
Japanese Patent JP3900759
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate holder for film deposition by sputtering, causing no fluctuation in sputter voltage in depositing a prescribed film onto a glass substrate by sputtering, and a method of fabrication for photomask blanks using it.
SOLUTION: A substrate holder 10 consists of a frame part 11 composed of metal, etc., and a part 12 for mounting a glass substrate thereon. A dummy part 13 of prescribed size, composed of glass with the same material quality as the glass substrate, is provided to the frame part 11.
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Inventors:
Akio Kuroda
Application Number:
JP28126599A
Publication Date:
April 04, 2007
Filing Date:
October 01, 1999
Export Citation:
Assignee:
Toppan Printing Co., Ltd.
International Classes:
C23C14/34; H01L21/027; G03F1/50; G03F1/54; (IPC1-7): C23C14/34; G03F1/08; H01L21/027
Domestic Patent References:
| JP11015140A | ||||
| JP6220628A | ||||
| JP9143733A | ||||
| JP5230651A | ||||
| JP5297570A |
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