Title:
SUBSTRATE HOLDER, SUBSTRATE TREATING METHOD, AND AUTOMATIC SUBSTRATE WASHER
Document Type and Number:
Japanese Patent JPH0845883
Kind Code:
A
Abstract:
PURPOSE: To provide a substrate holder, a substrate treating device, and an automatic substrate washer which are of simple and easy construction to prevent a cleaning liquid from remaining, thereby preventing pollution problems and the like for treatment with high reliability, in liquid treatment of a substrate to be treated such as washing, together with a holder.
CONSTITUTION: Substrates are supported by a holder 21 and treated with a solution. The holder 21 has drain holes 3 in its part in contact with substrates, and grooves 4 communicating with the drain holes and sloping downward.
Inventors:
TAJIMA KAZUHIRO
Application Number:
JP17659994A
Publication Date:
February 16, 1996
Filing Date:
July 28, 1994
Export Citation:
Assignee:
SONY CORP
International Classes:
B08B11/04; B08B3/00; B65D85/86; H01L21/304; H01L21/306; (IPC1-7): H01L21/304; B08B3/00; B65D85/86; H01L21/306
Attorney, Agent or Firm:
Toru Takatsuki
Next Patent: CLEANING METHOD FOR WAFER