Title:
SUBSTRATE HOLDER
Document Type and Number:
Japanese Patent JP2014231633
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To hold a substrate so that a film thickness of a thin film on a substrate surface is not caused to have ununiformity even when the thin film is formed on a substrate holder by sputtering.SOLUTION: A substrate holder 1A includes an opening 1a, holds a substrate 2 such that a substrate surface 2a is exposed to the opening 1a and faces a target 4, and includes an insulation thin film 10 having a film thickness of nm order on a surface of the substrate holder.
Inventors:
SHIMOMOTO ATSUSHI
KOMUKAI TAKUJI
KOMUKAI TAKUJI
Application Number:
JP2013113819A
Publication Date:
December 11, 2014
Filing Date:
May 30, 2013
Export Citation:
Assignee:
NITTA KK
International Classes:
C23C14/34; C23C14/50
Attorney, Agent or Firm:
Kazuhide Okada