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Patent Searching and Data


Title:
SUBSTRATE AND MASK-HOLDING MEMBER
Document Type and Number:
Japanese Patent JPH0989327
Kind Code:
A
Abstract:

To provide a holding member which causes less sticking of dust to a jig or the like such as a mask for patterning by using a photo-resist layer.

An auxiliary table 6 having a net surface is installed within a green bench 4. A supporting structure having stainless steel rod members 7 and columns 8 is mounted on the auxiliary table 6. With such an arrangement as above, it is possible to reduce influence of generation and sticking of dust to a jig or the like during a waiting time for a pattern forming step with a photo-resist.


Inventors:
NIIJIMA SHINICHI
Application Number:
JP25280595A
Publication Date:
April 04, 1997
Filing Date:
September 29, 1995
Export Citation:
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Assignee:
KOKUSAI ELECTRIC CO LTD
International Classes:
B08B17/06; F24F7/06; H01L21/027; H01L21/68; H01L21/683; (IPC1-7): F24F7/06; B08B17/06; H01L21/027; H01L21/68
Attorney, Agent or Firm:
Junnosuke Nakamura