PURPOSE: To obtain a substrate for a miniaturized optical device or a substrate for an optical device suitable for use in optical IC by interposing a buffer layer made of a dielectric having a lower refractive index than a light transmitting layer and small transmission loss between the light transmitting layer and an electrically conductive layer to reduce loss.
CONSTITUTION: A light transmitting layer 32 made of a material having a higher refractive index than a transparent substrate 31 and an electrooptical effect is formed on the substrate 31 to manufacture an optical waveguide 30. A buffer layer 33 having a lower refractive index than the layer 32 is formed on the layer 32, and an electrically conductive layer 34 is formed on the layer 33. Since the peripheral part 331 of the layer 33 can be tapered by leaving space 42 between the surface 321 of the layer 32 and a mask 41 having an opening 411 and by carrying out vacuum deposition, sputtering or ion beam sputtering, a substrate for an optical device with no transmission loss of light waves and beams at the peripheral part of the layer 33 is obtd.
| JPH0486707 | PRODUCTION OF OPTICAL WAVEGUIDE |
| JP4128382 | Light deflection element |
| WO/1993/024422 | LIGHT TRANSMITTING DEVICE AND METHOD FOR THE MANUFACTURE THEREOF |
OUCHI KENZOU
SETSUNE KENTAROU
