Title:
SUBSTRATE POSTURE CHANGING DEVICE AND SUBSTRATE PROCESSING DEVICE
Document Type and Number:
Japanese Patent JP2013048178
Kind Code:
A
Abstract:
To reduce manufacturing costs of a substrate posture changing device.
A substrate posture changing device 5 includes: a holding unit 6 that can rotate around a rotation axis L1 while holding a substrate W, and in which a position of a center of gravity GC while holding the substrate W is displaced from the rotation axis L1; a rotation stop unit 17 that can stop rotation of the holding unit 6 at plural positions at which rotation angles around the rotation axis L1 are different, and that can hold the holding unit 6 at the plural positions; and a traveling unit 9 that moves the holding unit 6 in a crossing direction D1 crossing with the rotation axis L1 and accelerates or decelerates the holding unit 6 in the crossing direction D1.
Inventors:
KIMURA YUSHIN
MURAMOTO RYO
MURAMOTO RYO
Application Number:
JP2011186273A
Publication Date:
March 07, 2013
Filing Date:
August 29, 2011
Export Citation:
Assignee:
DAINIPPON SCREEN MFG
International Classes:
H01L21/677
Attorney, Agent or Firm:
Inaoka cultivation
Mio Kawasaki
Masahide Yasuda
Mio Kawasaki
Masahide Yasuda
Previous Patent: SOLAR CELL MODULE AND MANUFACTURING METHOD OF THE SAME
Next Patent: SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
Next Patent: SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD