Title:
SUBSTRATE PROCESSING APPARATUS AND PROCESS LIQUID CHARGE MONITORING METHOD
Document Type and Number:
Japanese Patent JP2023097407
Kind Code:
A
Abstract:
To provide a substrate processing apparatus.SOLUTION: A substrate processing apparatus can include a substrate support unit that supports the substrate, a nozzle that supplies liquid to the substrate supported by the substrate support unit, a home port where the nozzle waits, and a charge measurement component that measures the amount of charge of the liquid dispensed by the nozzle at the home port.SELECTED DRAWING: Figure 8
Inventors:
KIM DO YEON
SON YOUNG JUN
LEE TAE HOON
LEE SUNG-GYU
YOON HYUN
SON YOUNG JUN
LEE TAE HOON
LEE SUNG-GYU
YOON HYUN
Application Number:
JP2022205549A
Publication Date:
July 07, 2023
Filing Date:
December 22, 2022
Export Citation:
Assignee:
SEMES CO LTD
International Classes:
B05C11/00; H01L21/027; B05C11/10; H01L21/304
Attorney, Agent or Firm:
Ryoichi Takaoka
Nao Oda
Akiyo Iwahori
Rena Miyoshi
Kamoto Takahashi
Nao Oda
Akiyo Iwahori
Rena Miyoshi
Kamoto Takahashi