Title:
基板処理装置およびその搬送制御方法
Document Type and Number:
Japanese Patent JP7261052
Kind Code:
B2
Abstract:
A substrate processing device 1 which transfers a substrate with a substrate surface coated with a liquid film is provided with: a first processing unit 11A which, in order to prevent exposure of the substrate surface due to vibrations, evaporation of liquid and the like during transfer, supplies a liquid to the substrate S and coats the substrate surface with a liquid film; a transfer mechanism 15 which transfers the substrate carrying the liquid film; a second processing unit 13A which receives the substrate transferred by the transfer mechanism and performs a predetermined process; an image capture unit 157 which captures an image of the liquid film formed on the substrate surface; and a control unit 90 which controls the operation of the transfer mechanism on the basis of a difference between a plurality of images captured by the image capture unit at mutually different times between when the liquid film was formed and when the substrate is loaded into the second processing unit by the transfer mechanism.
Inventors:
Hiroyuki Kawahara
Koji Hashimoto
Noriyuki Kikumoto
Sumi Shubu
Koji Hashimoto
Noriyuki Kikumoto
Sumi Shubu
Application Number:
JP2019058734A
Publication Date:
April 19, 2023
Filing Date:
March 26, 2019
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
H01L21/304; H01L21/027; H01L21/306; H01L21/677
Domestic Patent References:
| JP2018147994A | ||||
| JP2020017618A | ||||
| JP2019087687A |
Foreign References:
| WO2018216476A1 | ||||
| US20170345680 | ||||
| US20120064727 |
Attorney, Agent or Firm:
Swing angle Shoichi
Kazumasa Onishi
Kazumasa Onishi