Title:
SUBSTRATE PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2015115456
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which allows for stable supply of the mixture of a first liquid and a second liquid to a substrate, by removing the gas generated by mixing of the first liquid and second liquid from the nozzle.SOLUTION: A substrate processing apparatus 1 includes a phosphoric acid nozzle 18. The phosphoric acid nozzle 18 has a mixture introduction port 66, a delivery port 68, and an internal space (65) including a storage space 70 for leading the phosphoric acid aqueous solution and water flowing from the mixture introduction port 66 to the delivery port 68 while storing. Furthermore, the substrate processing apparatus 1 includes gas discharge piping connected with the phosphoric acid nozzle 18 and discharging the steam, produced in the internal space 65 when the phosphoric acid aqueous solution and water are mixed, to the outside of the phosphoric acid nozzle 18.
Inventors:
HINODE DAIKI
OTA TAKASHI
SAITO KAZUHIDE
OTA TAKASHI
SAITO KAZUHIDE
Application Number:
JP2013256264A
Publication Date:
June 22, 2015
Filing Date:
December 11, 2013
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD
International Classes:
H01L21/306; H01L21/304
Attorney, Agent or Firm:
Inaoka cultivation
Mio Kawasaki
Goromaru Masami
Mio Kawasaki
Goromaru Masami
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