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Title:
SUBSTRATE PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2016152354
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To enhance uniformity in processing while reducing consumption of process liquid supplied to a substrate.SOLUTION: A supply passage 47 is branched into a plurality of upstream passages 48. The plurality of upstream passages 48 include branched upstream passages which are branched into a plurality of downstream passages 52. A plurality of discharge ports 34 are arranged at a plurality of positions having different distances from a rotation axis, and process liquid supplied through the plurality of upstream passages 48 is discharged toward the top surface of a substrate W retained in a substrate holding unit.SELECTED DRAWING: Figure 1

Inventors:
KOBAYASHI KENJI
SAWASHIMA HAYATO
NISHIMURA YUDAI
Application Number:
JP2015029843A
Publication Date:
August 22, 2016
Filing Date:
February 18, 2015
Export Citation:
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Assignee:
SCREEN HOLDINGS CO LTD
International Classes:
H01L21/306; G03F7/30; H01L21/027; H01L21/304
Domestic Patent References:
JPH11165114A1999-06-22
JPH09162097A1997-06-20
JP2006041086A2006-02-09
JP2010050226A2010-03-04
JP2005217226A2005-08-11
JP2014209605A2014-11-06
JP2009218405A2009-09-24
JP2013026381A2013-02-04
JP2007180144A2007-07-12
Attorney, Agent or Firm:
Inaoka cultivation
Mio Kawasaki
Masahide Yasuda