Title:
基板処理装置および基板処理方法
Document Type and Number:
Japanese Patent JP6956924
Kind Code:
B2
Abstract:
A substrate processing apparatus includes a liquid processing tank, and a hydrophobizing gas supply unit. The liquid processing tank stores a processing liquid and dips a plurality of substrates in the processing liquid to liquid-process the plurality of substrates. The hydrophobizing gas supply unit supplies a gas of a hydrophobizing agent to the plurality of substrates after liquid processing thereof.
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Inventors:
Jun Nonaka
Mitsunori Nakamori
Mitsunori Nakamori
Application Number:
JP2021518211A
Publication Date:
November 02, 2021
Filing Date:
August 17, 2020
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/304
Domestic Patent References:
| JP2018056155A | ||||
| JP2001144065A | ||||
| JP2007005478A | ||||
| JP2016009727A |
Attorney, Agent or Firm:
Sakai International Patent Office