Title:
基板の処理方法、半導体装置の製造方法、基板処理用キット
Document Type and Number:
Japanese Patent JP6992095
Kind Code:
B2
Abstract:
The present invention provides a method for treating a substrate, which can remove transition metal-containing substances on a substrate with high efficiency while inhibiting cerium from remaining on the surface of the treated substrate. Furthermore, the present invention provides a method for manufacturing a semiconductor device including the method for treating a substrate, and a kit for treating a substrate that is applicable to the method for treating a substrate. The method for treating a substrate according to an embodiment of the present invention includes a step A of removing a transition metal-containing substance on a substrate by using a chemical solution, which includes a cerium compound and one or more pH adjusters selected from the group consisting of nitric acid, perchloric acid, ammonia, and sulfuric acid, for the substrate having the transition metal-containing substance, and a step B of performing a rinsing treatment on the substrate obtained by the step A by using one or more rinsing solutions selected from the group consisting of a solution including hydrogen peroxide and an acidic aqueous solution which is other than hydrofluoric acid, nitric acid, an aqueous perchloric acid solution, an aqueous oxalic acid solution, and a mixed aqueous solution of these and does not include hydrogen peroxide after the step A.
Inventors:
Tomoe Takahashi
Nobuaki Sugimura
Hiroyuki Seki
Nobuaki Sugimura
Hiroyuki Seki
Application Number:
JP2019569007A
Publication Date:
January 13, 2022
Filing Date:
January 21, 2019
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
H01L21/304; H01L21/306; H01L21/308
Domestic Patent References:
| JP2000260746A | ||||
| JP2013513824A | ||||
| JP2001234373A | ||||
| JP2007321186A |
Attorney, Agent or Firm:
Hideaki Ito
Fumio Mihashi
Fumio Mihashi