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Patent Searching and Data


Title:
SUBSTRATE PROCESSING SYSTEM
Document Type and Number:
Japanese Patent JP2994553
Kind Code:
B2
Abstract:

PURPOSE: To enhance the throughput in the processing of a substrate by utilizing a substrate processing section efficiently even when lots of different flow are processed continuously.
CONSTITUTION: When a substrate processing sections AH, SC being used by both preceding and following lots are not present, the circulation transfer on the following lot side relating to the substrate of following lot is interrupted at least one time during the interval, after circulation transfer on the side of first preceding lot including the first substrate of preceding lot before circulation transfer on the side of first preceding lot including the last substrate of preceding lot, in the circulation transfer of a transfer robot 10 on the preceding lot side relating to the preceding lot. Consequently, such situation can be avoided as the substrate processing sections required for processing the following lot are entirely emptied during processing of the preceding lot and the throughput is enhanced in the processing of substrate by utilizing the substrate processing sections AH, CP, HP, SC, SD efficiently.


Inventors:
Kenji Kabuki
Tetsuya Hamada
Kenji Kamei
Toru Morimoto
Application Number:
JP7103694A
Publication Date:
December 27, 1999
Filing Date:
April 08, 1994
Export Citation:
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Assignee:
Dainippon Screen Mfg. Co., Ltd.
International Classes:
G02F1/13; H01L21/00; H01L21/02; H01L21/677; (IPC1-7): H01L21/02; G02F1/13; H01L21/68
Attorney, Agent or Firm:
Shigeaki Yoshida (2 outside)