To provide a substrate transporting and processing apparatus for supplying processing liquid to a substrate to be processed and performing application processing, the substrate transporting and processing apparatus securing substrate transport accuracy and suppressing processing defects.
The substrate transporting and processing apparatus includes: a floating stage 22 for floating a substrate G at different heights by jetting of a gas or jetting and suction; a processing liquid supply nozzle 23 disposed above the floating stage 22, for supplying the processing liquid from a nozzle port formed in a slit shape in a substrate width direction onto the substrate to be processed; substrate carriers 50 provided movably along guide rails 25 disposed in parallel at left and right sides of the floating stage 22; a substrate holding member 24 provided on the substrate carrier 50, for freely detachably sucking and holding the side edge part of the substrate G to be processed from below; and a support member 51 disposed at the same position as the nozzle port of the processing liquid supply nozzle 23 in a substrate transport direction at least, for supporting the substrate carrier 50 at a position right below the substrate holding member 24.
MOTODA KIMIO
SHINOZAKI MASAYA
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