Title:
SUBSTRATE TREATING DEVICE
Document Type and Number:
Japanese Patent JPH1197329
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate treating device which can reduce the standing-by spaces of holding arms to which treating tools are respectively attached. SOLUTION: A plurality of holding arms 7 is radially arranged around a scattering preventing cup 2. When an arm supporting member 9 which swingably supports one of the holding arms 7 is raised by means of an air cylinder though a swinging shaft at the base-side end section of the arm 7, a cam follower 7b provided at the base-side end section is guided along a cam groove and the arm 7 is displaced in a swinging state while the arm 7 rises to a lying attitude at treating time from a standing attitude at standby time. Since the arms 7 are radially arranged around a scattering preventing cup 2 in standing attitudes when no substrate treatment is performed, the standing-by spaces of the arms 7 can be reduced.
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Inventors:
MORITA AKIHIKO
OTANI MASAMI
OTANI MASAMI
Application Number:
JP25325897A
Publication Date:
April 09, 1999
Filing Date:
September 18, 1997
Export Citation:
Assignee:
DAINIPPON SCREEN MFG
International Classes:
G03F7/16; B05C11/08; G03F7/30; H01L21/027; H01L21/304; (IPC1-7): H01L21/027; B05C11/08; G03F7/16; G03F7/30; H01L21/304
Attorney, Agent or Firm:
Tsutomu Sugitani