SUBSTRATE TREATMENT DEVICE

Japanese Patent JP2004214689

A

To provide a substrate treatment device having good workability when maintenance is performed, and having high flexibility in the arrangement of treatment units.

A unit arrangement section 10 is provided with a chemical cabinet 11 on the bottom. Above the chemical cabinet and at four corners of a device, coating treatment units SC1, SC2 to form a resist coat on a substrate as a liquid treatment unit, and development treatment units SD1, SD2 to perform development to the substrate after exposure, are located. In the center, a substrate carrying means TR1 rotatable around a perpendicular shaft is located. Additionally, on upper sides of these liquid treatment units, multistage heat treatment units 20 to heat-treat a substrate are located at a front section and a rear section of the device. And also, on the front side of the device and between the coating treatment units SC1, SC2, a cleaning treatment unit SS as a substrate treatment unit to apply washing such as pure water to the substrate, and to clean the substrate is located.

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OTANI MASAMI
IMANISHI YASUO
TSUJI MASAO
KAWAMOTO TAKANORI
IWAMI MASAKI
NISHIMURA JOICHI
MORITA AKIHIKO

JP2004009106A

July 29, 2004

January 16, 2004

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DAINIPPON SCREEN MFG

H01L21/677; H01L21/027; H01L21/304; H01L21/68; (IPC1-7): H01L21/68; H01L21/027; H01L21/304

Shigeaki Yoshida
Yoshitake Hidetoshi
Takahiro Arita

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