Title:
SUBSTRATE TREATMENT DEVICE
Document Type and Number:
Japanese Patent JP2012020881
Kind Code:
A
Abstract:
To improve a known device for continuously treating a substrate while starting from a conventional technology.
The substrate treatment device for treating the substrate includes: a device chamber demarcated by a chamber wall 1; at least one substrate treatment device in the device chamber; and a conveying device having an arrangement of conveyance rollers 3 arranged in the conveyance direction, and conveying the substrate in an erected state or a laid state. In at least a first group of the conveyance rollers 3 in those which are sequentially arranged, each of the conveyance rollers 3 has its own drive device 6.
Inventors:
HENRIK OBST
Application Number:
JP2011152687A
Publication Date:
February 02, 2012
Filing Date:
July 11, 2011
Export Citation:
Assignee:
VON ARDENNE ANLAGENTECHNIK GMBH
International Classes:
B65G13/06; H01L21/677
Domestic Patent References:
| JPS62230513A | 1987-10-09 | |||
| JP2008297584A | 2008-12-11 | |||
| JP2005232584A | 2005-09-02 | |||
| JPH0982775A | 1997-03-28 | |||
| JP2010100432A | 2010-05-06 | |||
| JP2006237161A | 2006-09-07 | |||
| JP2004274889A | 2004-09-30 | |||
| JP2006296060A | 2006-10-26 | |||
| JP2007325433A | 2007-12-13 |
Attorney, Agent or Firm:
Mitsufumi Esaki
Blacksmith
Ryota Imamura
Kiyota Eisho
Blacksmith
Ryota Imamura
Kiyota Eisho