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Title:
SUBSTRATE WASHING DEVICE
Document Type and Number:
Japanese Patent JP2001118822
Kind Code:
A
Abstract:

To prevent impurities such as organic ones from entering when introducing clean room air into a washing chamber, and at the same time efficiently unload air in the washing chamber even when a substrate is being rotated speedily.

In the washing device that at least has a washing chamber 101 being shielded from the fresh air, and washes a substrate 109 in the washing chamber 101, pressure in the washing chamber 101 is reduced as compared with the atmospheric pressure, thus allowing air to flow in a fixed direction from the upper portion to the lower one in the washing chamber 101 and efficiently unloading air when the substrate 102 is being rotated speedily.


Inventors:
YAMAGUCHI YOSHIAKI
NITTA TAKEHISA
Application Number:
JP29414199A
Publication Date:
April 27, 2001
Filing Date:
October 15, 1999
Export Citation:
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Assignee:
UCT KK
International Classes:
B08B5/00; F04B9/00; H01L21/304; (IPC1-7): H01L21/304; B08B5/00
Domestic Patent References:
JPH09148231A1997-06-06
JPH09270403A1997-10-14
JPH10340874A1998-12-22
JPH04371205A1992-12-24
Attorney, Agent or Firm:
Kokubun Takaetsu



 
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