SUBSTRATE WASHING DEVICE

Title:

SUBSTRATE WASHING DEVICE

Document Type and Number:

Japanese Patent JP2004273715

Kind Code:

A

Abstract:

To make preventable a substrate from being contaminated by the droplets of a treatment liquid stuck to the discharging part of a treatment liquid supplying means by preventing the droplets of the treatment liquid from being scattered.

While washing the substrate W rotated together with a supporting plate 1 with a washing liquid nozzle 41, a rinsing liquid is supplied to the lower surface of the substrate W. Even when the rinsing liquid is stuck to the discharging part of a back rinse nozzle 32 in the case, the rinsing liquid is collected by a liquid accumulation part 33. Consequently, inconvenience that the droplets of the rinsing liquid is scattered by the supporting plate 1 and stuck to the lower surface of the substrate W is eliminated, thereby the substrate W can be prevented from being contaminated by the droplets.

Inventors:

SATO KAZUO
YOSHIDA MASAHIRO
MICHIMAE HAJIME

Application Number:

JP2003061673A

Publication Date:

September 30, 2004

Filing Date:

March 07, 2003

Export Citation:

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Assignee:

HITACHI LTD
DAINIPPON SCREEN MFG

International Classes:

G02F1/13; B08B3/02; G02F1/1333; H01L21/304; (IPC1-7): H01L21/304; B08B3/02; G02F1/13; G02F1/1333

Attorney, Agent or Firm:

Tsutomu Sugiya

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