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Title:
スルホネート化合物、光酸発生剤及びフォトリソグラフィー用樹脂組成物
Document Type and Number:
Japanese Patent JP6622210
Kind Code:
B2
Abstract:
Provided are: a non-ionic photoacid generator containing a sulfonate compound having a high photosensitivity to i lines, exhibiting excellent heat-resistance stability, and exhibiting excellent solubility in a hydrophobic material; and a resin composition for photolithography containing the same. The present invention is a sulfonate compound characterized by being represented by general formula (1). [In formula (1), R1 represents an aryl group having 6 to 18 carbon atoms or a heterocyclic hydrocarbon group having 4 to 20 carbon atoms. R2 represents a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, an alkynyl group having 2 to 18 carbon atoms, or an aryl group having 6 to 18 carbon atoms. R3 represents a hydrocarbon group having 1 to 18 carbon atoms (in which some or all hydrogen atoms may be substituted with fluorine).]

Inventors:
Masaaki Oka
Nakamura Yuji
Application Number:
JP2016557445A
Publication Date:
December 18, 2019
Filing Date:
October 13, 2015
Export Citation:
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Assignee:
Sun Appro Co., Ltd.
International Classes:
C07C309/65; C07C309/66; C07C309/73; C07D311/16; C09K3/00; G03F7/004; G03F7/038
Domestic Patent References:
JP1293339A
JP11038630A
JP10228109A
JP10016423A
JP9185160A
JP9239945A
JP2100055A
JP2007031351A
Foreign References:
US4371605
Other References:
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Database: ChemSpider (ChemZoo, Inc.),Entered STN: 13 Jun 2008, accession No.1027984-84-4 REGISTRY[online], [retrieved on 2015.12.14], retrieved from: STN
Chemical Library Supplier: Ambinter,Entered STN: 28 Nov 2008, accession No.304645-12-3 REGISTRY[online], [retrieved on 2015.12.14], retrieved from: STN
Attorney, Agent or Firm:
Hirofumi Hayashi