To provide a sulfonium salt compound which can be used as a more practical acid-generating agent for resist use and a photocationic polymerization initiator.
A triphenylsulfonium salt compound is represented by formula [1] [R1 and R2 are each independently hydrogen atom or a lower alkyl group, and at least either of them is a lower alkyl group; n pieces of R3 are each independently an alkyl group; n is an integral number of 0 to 3; i is an integral number of 1 to 3; j is an integral number of 0 to 2; i+j=3; and Y- is an anion derived from a sulfonic acid represented by the formula: R4-SO3H (R4 is an alkyl group or aryl group which may have an alkyl group as the substituent)] or formula [3] (X is phenyl group having substituents at its ortho and/or meta positions; m is an integral number of 1 to 3; q is an integral number of 0 to 2; m+q=3; p is 1 or 2; and ZP- is an anion derived from a carboxylic acid).
FUKAZAWA KAZUHITO
SAKAMOTO KAZUNORI
URANO FUMIYOSHI
SUMINO MOTOSHIGE
IMAZEKI SHIGEAKI
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