Title:
Super-resolving imaging lithography
Document Type and Number:
Japanese Patent JP6127203
Kind Code:
B2
Abstract:
Provided are apparatuses and methods for super resolution imaging photolithography. An exemplary apparatus may includean illumination light generation device configured to generate illumination light for imaging a pattern included in a mask through the mask. The illumination light may include a high-frequency spatial spectrum such that a high-frequency evanescent wave component of spatial spectrum information for the light is converted to a low-frequency evanescent wave component after being transmitted through the mask pattern. For example, the illumination light generation device may be configured to form the illumination in accordance with a high numerical aperture (NA) illumination mode and/or a surface plasmon (SP)wave illumination mode.
Inventors:
Luo, Shangan
Wang, Chang Tao
Jiao, Zeyu
One, Yang Ching
Pu, minbo
Yao, na
Gao, Pin
Hu, Ju Young Gun
Li, Zion
Hwang, Chuyoung
Yang, Ray Ray
Ryu, Litin
One, Zeon
F, Jayu
Luo, Yun Fei
Ryu, Kaipen
Jiao, Shenway
Ryu, Rin
Ma, Shaolyang
One, Min
Wang, Chang Tao
Jiao, Zeyu
One, Yang Ching
Pu, minbo
Yao, na
Gao, Pin
Hu, Ju Young Gun
Li, Zion
Hwang, Chuyoung
Yang, Ray Ray
Ryu, Litin
One, Zeon
F, Jayu
Luo, Yun Fei
Ryu, Kaipen
Jiao, Shenway
Ryu, Rin
Ma, Shaolyang
One, Min
Application Number:
JP2016505702A
Publication Date:
May 10, 2017
Filing Date:
September 23, 2014
Export Citation:
Assignee:
Institute of Photoelectric Technology, Chinese Academy of Sciences
International Classes:
G03F7/20; G03F1/00
Domestic Patent References:
| JP8179493A | ||||
| JP11233427A | ||||
| JP2004335905A | ||||
| JP2005328020A |
Other References:
K.V. Sreekanth, et al.,"Multiple beams surface plasmon interference generation: A theoretical analysis",Optics Communications,2011年,vol.284,pp.2042-2045
Kandammathe Valiyaveedu Sreekanth, et al.,"Interferometric lithography for nanoscale feature patterning: a omparative analysis between laser interference, evanescent wave interference, and surface plasmon interference",APPLIED OPTICS,2010年12月10日,Vol. 49, No. 35,pp.6710-6717
Xiangang Luo, et al.,"Surface plasmon resonant interference nanolithography technique",Applied Physics Letters,2004年 6月 7日,vol.84,4780-4782
Kandammathe Valiyaveedu Sreekanth, et al.,"Interferometric lithography for nanoscale feature patterning: a omparative analysis between laser interference, evanescent wave interference, and surface plasmon interference",APPLIED OPTICS,2010年12月10日,Vol. 49, No. 35,pp.6710-6717
Xiangang Luo, et al.,"Surface plasmon resonant interference nanolithography technique",Applied Physics Letters,2004年 6月 7日,vol.84,4780-4782
Attorney, Agent or Firm:
Sakaki Morishita