成膜用支持基板、および、多結晶基板の製造方法

Title:

成膜用支持基板、および、多結晶基板の製造方法

Document Type and Number:

Japanese Patent JP7375580

Kind Code:

B2

Abstract:

To provide a deposition support substrate capable of easily separating a laminate having a desired size from a laminate of a support substrate and a film deposited by a chemical vapor deposition method, reducing a period of time required for the separation to improve production efficiency and suppressing the wear of a separation tool to reduce cost by prolonging the life of the separation tool, and a method for manufacturing a polycrystal substrate using the same.SOLUTION: A deposition support substrate used for depositing a film by a chemical vapor deposition method to manufacture a substrate includes a surface to be deposited and a groove formed on the surface to be deposited. The width of the groove is 1-10 mm, and the depth of the groove in the thickness direction of the deposition support substrate is 0.5 mm or more.SELECTED DRAWING: Figure 2

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Inventors:

Akira Terashima

Application Number:

JP2020011546A

Publication Date:

November 08, 2023

Filing Date:

January 28, 2020

Export Citation:

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Assignee:

Sumitomo Metal Mining Co., Ltd.

International Classes:

C30B25/18; C23C16/42; C30B29/36

Domestic Patent References:

JP10226574A

Foreign References:

WO2018159754A1

Attorney, Agent or Firm:

Fumio Takino
Toshiaki Tsuda
Yasuhiro Fukuda
Atsushi Watanabe

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