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Title:
SURFACE-MODIFIED INORGANIC PARTICLE, SURFACE-MODIFIED INORGANIC PARTICLE LIQUID DISPERSION, PRODUCTION METHOD OF THE SAME, AND PHOTOCURABLE COMPOSITION
Document Type and Number:
Japanese Patent JP2021109934
Kind Code:
A
Abstract:
To provide a surface modified inorganic particle excellent in photocurable coating, and giving photo curable property and scratch resistance.SOLUTION: The surface-modified inorganic particle is constituted by chemically bonding one pts.mass or more of an organosilicon compound having a photopolymerization initiation part represented by, for example, the following formula (1) to 100 pts.mass of an inorganic particle having a median size in a volume-base particle distribution of 1-100 nm. In the formula (1), Z is a group having a photopolymerization initiation part, R1 is a single bond, a 1-20C alkylene group, or a 1-20C oxyalkylene group, R2 is each independently a hydrogen atom, a 1-20C alkyl group, a 2-20C alkenyl group, or a 6-20C aryl group, R3 is a hydroxy group, a 1-6C alkoxy group, or a halogen atom, and n is an integer of 1-3.SELECTED DRAWING: None

Inventors:
YOSHII RYOSUKE
MATSUMURA KAZUYUKI
Application Number:
JP2020003675A
Publication Date:
August 02, 2021
Filing Date:
January 14, 2020
Export Citation:
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Assignee:
SHINETSU CHEMICAL CO
International Classes:
C09C3/12; C07F7/08; C07F7/10; C07F9/28; C09C1/28
Domestic Patent References:
JP2011157435A2011-08-18
JP2011157436A2011-08-18
Attorney, Agent or Firm:
Hideaki International Patent Office