Title:
Surface selectivity polish constituent
Document Type and Number:
Japanese Patent JP6050839
Kind Code:
B2
Abstract:
The present invention provides polishing compositions that show a high polishing rate ratio of a silicon nitride (SiN) surface to a silicon oxide surface, and/or of a SiN surface to a polycrystalline silicon (Poly Si) surface. Such compositions comprise, in certain aspects, of colloidal silica, and one or more water soluble polymers, and has a pH of 6 or less, wherein the colloidal silica comprises one or more organic acids bound to its surface, and the water soluble polymer is a polyoxyalkylene hydrocarbyl ether which hydrocarbyl group has 12 or more carbon atoms.
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Inventors:
Kim foo sun
Miller Ann
Miller Ann
Application Number:
JP2014559578A
Publication Date:
December 21, 2016
Filing Date:
January 29, 2014
Export Citation:
Assignee:
Fujimi Incorporated Co., Ltd.
International Classes:
H01L21/304; B24B37/00; C09K3/14
Domestic Patent References:
| JP2013021291A | 2013-01-31 | |||
| JP2009212378A | 2009-09-17 |
Attorney, Agent or Firm:
Tetsuya Mori
Suzuki Isobe
Hide Tanaka Tetsu
Yuki Yamada
Suzuki Isobe
Hide Tanaka Tetsu
Yuki Yamada