Title:
SURFACE TREATMENT COMPOSITION, METHOD FOR MANUFACTURING SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
Document Type and Number:
Japanese Patent JP2022054189
Kind Code:
A
Abstract:
To provide means to sufficiently remove organic residues from a surface of polished abrasive objects.SOLUTION: A surface treatment composition of a polished abrasive object contains a polymer having a configuration unit of a following formula (1), a chelating agent, and water. In the above formula (1), R1 is a hydrocarbon group having 1 to 5 carbons, R2 is a hydrogen atom or a hydrocarbon group having 1 to 3 carbons, and the chelating agent has at least one of phosphonic acid group and carboxylic acid group.SELECTED DRAWING: None
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Inventors:
YOSHINO TSUTOMU
ISHIGURO SONOSUKE
ISHIGURO SONOSUKE
Application Number:
JP2020161242A
Publication Date:
April 06, 2022
Filing Date:
September 25, 2020
Export Citation:
Assignee:
FUJIMI INC
International Classes:
H01L21/304; C11D7/22; C11D7/26
Attorney, Agent or Firm:
田中 秀▲てつ▼
Yuki Yamada
Tetsuya Mori
Yuki Yamada
Tetsuya Mori
Previous Patent: JPWO2022054188
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