To provide a system and method for exposure by which working can be performed with resolution that is shorter than the wavelength of the light source and exposure time can be shortened, and then patterns arranged adjacently can be exposed independently.
The exposure system has a light-emitting section 102 embedded in a plate-like member 101, arranged to face an object 103 to be exposed containing a photosensitive member and an alignment mechanism which positions the light emitting section 102 adjacently to the photosensitive member. At least a part (A or B) of the width of the light-emitting section 102 is made narrower than the light-emitting wavelength of the section 102. In addition, the alignment mechanism has a means, which performs exposure by positioning the light- emitting member 102 at a distance shorter than the light-emitting wavelength of the section 102 from the photosensitive member.
OKAMOTO KOHEI
KURODA AKIRA
