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Title:
SYSTEM AND METHOD FOR FLAW DETECTION BASED ON PHOTON EMISSION
Document Type and Number:
Japanese Patent JP2010133958
Kind Code:
A
Abstract:

To provide a method for detecting any defective device in an integrated circuit by utilizing photon emission.

The method includes a step to obtain the emitted image (IREM) from area of the integrated circuit 160, a step to determine value of intensity in emission from each device existing in the area of the integrated circuit for providing decided intensity, a step to obtain reference intensity for each device, and a step in which the intensity is plotted to the reference intensity, curve-fitting calculation is performed to acquire linear relationship between the calculated intensity and the reference intensity, and maximum deviation uses calculation such as standard deviation calculation or manual input by user to compare each decided intensity with its associated reference intensity.

COPYRIGHT: (C)2010,JPO&INPIT


Inventors:
KHURANA NEERAJ
Application Number:
JP2009274367A
Publication Date:
June 17, 2010
Filing Date:
December 02, 2009
Export Citation:
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Assignee:
DCG SYSTEMS INC
International Classes:
H01L21/66; G01R31/302
Domestic Patent References:
JPH06194407A1994-07-15
JP2001194323A2001-07-19
JP2006047309A2006-02-16
Attorney, Agent or Firm:
Hiroshi Maeda
Hiroshi Takeuchi
Takahisa Shimada
Yuji Takeuchi
Katsumi Imae
Kazunari Ninomiya
Tomoo Harada
Iseki Katsumori
Seki Kei
Yasuya Sugiura